On September 8, Yole Développement will host the first Executive Infrared Imaging Forum, which will take place alongside the 18th China International Optoelectronic Expo 2016 in Shenzhen.
Titled, “Executive Infrared Imaging Forum: From niche to large volume applications,” the one-day event will bring together a global community of infrared imaging users and application experts. It will discuss the current status and future of the infrared imaging industry, challenges of infrared applications and new functions, and the latest technologies and coinciding manufacturing process, material, and equipment. Additionally, the forum will provide networking opportunities for key players in the infrared imaging industry, from both China and the international community.
Representatives from Autoliv and Heimann Sensors will provide keynote speakers, while speakers from Device-ALab, Guide, INO, Robert Bosch, Shanghai Institute of Technical Physics, Sirius, System Plus Consulting, ULIS, Umicore, Telops, and Yole Développement will also present. Presentations will cover such topics as uncooled infrared imaging, thermodiode infrared technology, molded/wafer-level optics, fabless development of CMOS microbolometer focal plane arrays, hyperspectral imaging, and SWIR imaging, among others.
View more information on the event here.
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