Max Levy Autograph to showcase machine vision grid and targets at SPIE Photonics West 2014
Max Levy Autograph’s machine vision grids and targets are used to inspect and calibrate automated or robotic equipment, medical diagnostic equipment, manufacturing monitoring equipment and semiconductor processing systems. These patterned samples can be used in 2D or 3D systems and are used to measure various machine vision field parameters, such as magnification and distortion. Max Levy Autograph creates large grids, up to 3,000 mm, as well as custom grids for small machine vision systems, down to 1 mm. In 2013, Max Levy Autograph was ISO 17025 certified for calibration, which is a globally recognized standard for testing and calibration laboratories. These machine vision grids and targets will be showcased at SPIE Photonics West 2014 in San Francisco from February 1-6.
SPIE Photonics West 2014 booth number: 4831
To Learn More:
Contact: Max Levy Autograph
Headquarters: Philadelphia, PA, USA
Product: Machine vision grids and targets
Key Applications: Grid and dot arrays, gray scale targets, Ronchi rulings, distortion targets, reticles, and optical encoders.
What Max Levy Autograph says:
View more information on the machine vision grids and targets.
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James Carroll
Former VSD Editor James Carroll joined the team 2013. Carroll covered machine vision and imaging from numerous angles, including application stories, industry news, market updates, and new products. In addition to writing and editing articles, Carroll managed the Innovators Awards program and webcasts.